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Project Description:Our client is one of the world's leading manufacturers of lithography equipment and a majority of the world's microchips receive their critical lithographic patterning in their machines. In addition they also produce metrology tools and advanced applications to analyze and optimize the performance of the production process. In their applications department they develop analytics & control solutions that improve the accuracy of performance metrics (such as overlay, focus, critical dimension) as measured on the end product of a fab process (wafers with chip structures).In this project you will work on the platform that analyzes the measurement data and calculates required corrections that are sent back into the lithography machines.Business trips to the client site in the Netherlands might happen 1-2 weeks/quarter (every 3 months)Responsibilities:In the beginning of the project, writing documentation and project setup will represent a big part of the responsibility (vs. coding)Participate in new features development.Involved in requirements clarification, alignmentParticipate in testing activities: unit, functional, regression, API testing etc.Participate in design sessions & contributing to documentation.Development is mostly for new features.Development is mostly for back-end side.Mandatory Skills Description:Bachelor's degree6+ years of Java development experienceJava8, Java11Leading experienceExperience with application servers (Wildfly/JBoss), microservice architectureGraalVMExperience with security & code obfuscationExperience with multithreading & multiprocessing.Experience with profiling & memory complexity (memory optimization techniques, lazy loading, peak usage, performance tuning for algorithms, experience with a profiler app etc.)Good knowledge of Garbage CollectionExperience with software design/architectureExperience with different testing levels (unit, integration, regression etc.)
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